Materials for microlithography : radiation-sensitive polymers : based on a symposium cosponsored by the Division of Polymeric Materials, Science and Engineering and the Division of Polymer Chemistry, at the 187th Meeting of the American Chemical Society, St. Louis, Missouri, April 8-13, 1984 /
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| Corporate Authors: | , , |
|---|---|
| Other Authors: | , , |
| Format: | Book |
| Language: | English |
| Published: |
Washington, D.C. :
American Chemical Society,
1984.
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| Series: | ACS symposium series ;
266. |
| Subjects: |