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841005s1984 dcua b 101 0 eng |
| 010 |
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|a 36677816
|a 847571246
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|a 0841208719
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|a 9780841208711
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|a (OCoLC)11316033
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|a DLC
|b eng
|c DLC
|d OCLCQ
|d BAKER
|d BTCTA
|d LVB
|d YDXCP
|d OCLCG
|d ZWZ
|d OKU
|d TULIB
|d OCLCO
|d OCLCQ
|d OCLCF
|d OCLCO
|d OCL
|d OCLCO
|d OCLCQ
|d CSJ
|d NJR
|d OCLCQ
|d BGU
|d OCLCO
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| 049 |
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|a MS9A
|
| 050 |
0 |
0 |
|a TK7871.15.P6
|b M37 1984
|
| 082 |
0 |
0 |
|a 621.381/73
|2 19
|
| 245 |
0 |
0 |
|a Materials for microlithography :
|b radiation-sensitive polymers : based on a symposium cosponsored by the Division of Polymeric Materials, Science and Engineering and the Division of Polymer Chemistry, at the 187th Meeting of the American Chemical Society, St. Louis, Missouri, April 8-13, 1984 /
|c L.F. Thompson, editor, C.G. Willson, editor, J.M.J. Fréchet, editor.
|
| 246 |
3 |
0 |
|a Radiation-sensitive polymers
|
| 260 |
|
|
|a Washington, D.C. :
|b American Chemical Society,
|c 1984.
|
| 300 |
|
|
|a viii, 494 pages :
|b illustrations ;
|c 24 cm.
|
| 336 |
|
|
|a text
|b txt
|2 rdacontent
|
| 337 |
|
|
|a unmediated
|b n
|2 rdamedia
|
| 338 |
|
|
|a volume
|b nc
|2 rdacarrier
|
| 490 |
1 |
|
|a ACS symposium series,
|x 0097-6156 ;
|v 266
|
| 504 |
|
|
|a Includes bibliographical references and indexes.
|
| 505 |
0 |
|
|a Fundamental limits of lithography / T.E. Everhart -- Practical and fundamental aspects of lithography / A.N. Broers -- A perspective on resist materials for fine-line lithography / M.J. Bowden -- Fundamental radiation chemistry : fundamental aspects of polymer degradation by high-energy radiation / D.J.T. Hill, J.H. O'Donnell, and P.J. Pomery -- Pulse radiolysis studies on the mechanism of the high sensitivity of chloromethylated polystyrene as an electron negative resist / Y. Tabata, S. Tagawa, and M. Washio -- Photochemistry of ketone polymers in the solid phase : a review / J.E. Guillet, S.-K.L. Li, and H.C. Ng -- Radiolysis of poly(isopropenyl t-butyl ketone) / S.A. Macdonald, H. Ito, C.G. Willson, J.W. Moore, H.M. Gharapetian, and J.E. Guillet -- Polymer-bonded electron-transfer sensitizers / S. Tazuke, R. Takasaki, Y. Iwaya, and Y. Suzuki -- Laser-induced polymerization / C. Decker -- Novel synthesis and photochemical reaction of the polymers with pendant photosensitive and photosensitizer groups / T. Nishikubo, T. Iizawa, and E. Takahashi -- A novel technique for determining radiation chemical yields of negative electron-beam resists / A. Novembre and T.N. Bowmer -- Anomalous topochemical photoreaction of olefin crystals / M. Hasegawa, K. Saigo, and T. Mori -- The photo-Fries rearrangement and its use in polymeric imaging systems / T.G. Tessier, J.M.J. Frechet, C.G. Willson, and H. Ito -- Soluble polysilane derivatives : interesting new radiation-sensitive polymers / R.D. Miller, D. Hofer, D.R. McKean, C.G. Willson, R. West, and P.T. Trefonas, III -- Preparation and resolution characteristics of a novel silicone-based negative resist / A. Tanaka, M. Morita, S. Imamura, T. Tamamura, and O. Kogure -- Positive-working electron-beam resists based on maleic anhydride copolymers / K.U. Pohl, F. Rodriguez, Y.M.N. Namaste, and S.K. Obendorf -- Functionally substituted Novolak resins : lithographic applications, radiation chemistry, and photooxidation / H. Hiraoka -- Synthesis, characterization and lithographic evaluation of chlorinated polymethylstyrene / R. Tarascon, M. Hartney, and M.J. Bowden -- Photochemistry of ketone polymers in the solid phase : thin film studies of vinyl ketone polymers / J.E. Guillet, S.-K.L. Li, S.A. Macdonald, and C.G. Willson -- Polymers of [alpha]-substituted benzyl methacrylates and aliphatic aldehydes as new types of electron-beam resists / K. Hatada, T. Kitayama, Y. Okamoto, H. Yuki, H. Aritome, S. Namba, K. Nate, T. Inoue, and H. Yokono -- Radiation chemistry of phenolic resin containing epoxy and azide compounds / H. Shiraishi, T. Ueno, O. Suga, and S. Nonogaki -- Organic direct optical recording media / L. Alexandru, M.A. Hopper, R.O. Loutfy, J.H. Sharp, P.S. Vincett, G.E. Johnson, and K.Y. Law -- Primary and secondary reactions in photoinitiated free-radical polymerization of organic coatings / A. Hult and B. Ranby -- Radiation stability of silicon elastomers / G.C. Corfield, D.T. Astill, and D.W. Clegg.
|
| 650 |
|
0 |
|a Polymers
|v Congresses.
|
| 650 |
|
0 |
|a Photoresists
|v Congresses.
|
| 650 |
|
0 |
|a Microlithography
|x Materials
|v Congresses.
|
| 650 |
|
0 |
|a Microelectronics
|x Materials
|v Congresses.
|
| 650 |
|
0 |
|a Lithography
|v Congresses.
|
| 650 |
|
0 |
|a Microlithography
|v Congresses.
|
| 650 |
|
4 |
|a Polymers
|v Congresses.
|
| 650 |
|
4 |
|a Photoresists
|v Congresses.
|
| 650 |
|
4 |
|a Lithography
|v Congresses.
|
| 650 |
|
4 |
|a Microelectronics
|x Materials
|v Congresses.
|
| 650 |
|
6 |
|a Polymères
|0 (CaQQLa)201-0000257
|v Congrès.
|0 (CaQQLa)201-0378219
|
| 650 |
|
6 |
|a Résines photosensibles
|0 (CaQQLa)201-0090345
|v Congrès.
|0 (CaQQLa)201-0378219
|
| 650 |
|
6 |
|a Lithographie
|0 (CaQQLa)201-0035863
|v Congrès.
|0 (CaQQLa)201-0378219
|
| 650 |
|
6 |
|a Microélectronique
|0 (CaQQLa)201-0035977
|x Matériaux
|0 (CaQQLa)201-0379329
|v Congrès.
|0 (CaQQLa)201-0378219
|
| 650 |
|
6 |
|a Microlithographie
|0 (CaQQLa)201-0141616
|v Congrès.
|0 (CaQQLa)201-0378219
|
| 650 |
|
6 |
|a Microlithographie
|0 (CaQQLa)201-0141616
|x Matériaux
|0 (CaQQLa)201-0379329
|v Congrès.
|0 (CaQQLa)201-0378219
|
| 650 |
|
7 |
|a Microelectronics
|x Materials.
|2 fast
|0 (OCoLC)fst01019771
|
| 650 |
|
7 |
|a Microlithography
|x Materials.
|2 fast
|0 (OCoLC)fst01019885
|
| 650 |
|
7 |
|a Photoresists.
|2 fast
|0 (OCoLC)fst01062099
|
| 650 |
|
7 |
|a Polymers.
|2 fast
|0 (OCoLC)fst01070588
|
| 650 |
|
7 |
|a Polymères
|x Congrès.
|2 ram
|
| 650 |
|
7 |
|a Microlithographie
|x Congrès.
|2 ram
|
| 655 |
|
7 |
|a Conference papers and proceedings.
|2 fast
|0 (OCoLC)fst01423772
|
| 700 |
1 |
|
|a Thompson, L. F.,
|d 1944-
|
| 700 |
1 |
|
|a Willson, C. G.
|q (C. Grant),
|d 1939-
|
| 700 |
1 |
|
|a Fréchet, Jean M. J.
|
| 710 |
2 |
|
|a American Chemical Society.
|b Division of Polymeric Materials: Science and Engineering.
|
| 710 |
2 |
|
|a American Chemical Society.
|b Division of Polymer Chemistry.
|
| 710 |
2 |
|
|a American Chemical Society.
|b Meeting
|n (187th :
|d 1984 :
|c Saint Louis, Mo.)
|
| 830 |
|
0 |
|a ACS symposium series ;
|v 266.
|
| 999 |
1 |
0 |
|i 85f65af3-4763-448f-a156-5e4764925829
|l 990010011600104318
|s US-MNSTCLS
|m materials_for_microlithographyradiation_sensitive_polymers_based_on_a______1984_______ameria___________________________________________________________________________p
|
| 999 |
1 |
1 |
|l 990010011600104318
|s ISIL:US-MNSTCLS
|i St. Cloud State University
|t BKS
|a MSTA
|c TK7871.15.P6 M37 1984
|b 30102004921373
|x BOOK
|y 2342549170004318
|p LOANABLE
|