Electronic and photonic applications of polymers /
Annotation.
Saved in:
Corporate Authors: | , |
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Other Authors: | , |
Format: | Book |
Language: | English |
Published: |
Washington, DC :
American Chemical Society,
1988.
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Series: | Advances in chemistry series ;
218. |
Subjects: |
MARC
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245 | 0 | 0 | |a Electronic and photonic applications of polymers / |c Murrae J. Bowden, editor, S. Richard Turner, editor. |
260 | |a Washington, DC : |b American Chemical Society, |c 1988. | ||
300 | |a xiii, 372 pages : |b illustrations ; |c 24 cm. | ||
336 | |a text |b txt |2 rdacontent | ||
337 | |a unmediated |b n |2 rdamedia | ||
338 | |a volume |b nc |2 rdacarrier | ||
490 | 1 | |a Advances in chemistry series ; |v 218 | |
500 | |a "Developed from a symposium sponsored by the Division of Polymeric Materials: Science and Engineering at the 192nd Meeting of the American Chemical Society, Anaheim, California, September 7-12, 1986." | ||
504 | |a Includes bibliographical references and indexes. | ||
520 | 8 | |a Annotation. |b Papers of a symposium at the 192nd Meeting of the ACS Anaheim, Calif. Sept. 1988. Polymers have become a part of our everyday life. In the telecommunications industry applications have ranged from replacement of lead as a sheath in electric cable to meeting the stringent requirements for dielectrics in transoceanic communication. This seven-chapter book details the latest developments and trends in these applications. Annotation(c) 2003 Book News, Inc., Portland, OR (booknews.com). | |
546 | |a English. | ||
650 | 0 | |a Polymers. | |
650 | 0 | |a Photoresists |v Congresses. | |
650 | 0 | |a Microlithography |x Materials |v Congresses. | |
650 | 0 | |a Photoresists |x Congresses. | |
650 | 0 | |a Microlithography |x Materials |x Congresses. | |
650 | 2 | |a Polymers |0 (DNLM)D011108 | |
650 | 6 | |a Polymères and polymérisation |x Congrès. | |
650 | 6 | |a Résines photosensibles |0 (CaQQLa)201-0090345 |x Congrès. |0 (CaQQLa)201-0378208 | |
650 | 6 | |a Microlithographie |0 (CaQQLa)201-0141616 |x Matériaux |0 (CaQQLa)201-0379329 |x Congrès. |0 (CaQQLa)201-0378208 | |
650 | 6 | |a Polymères. |0 (CaQQLa)201-0000257 | |
650 | 6 | |a Résines photosensibles |0 (CaQQLa)201-0090345 |v Congrès. |0 (CaQQLa)201-0378219 | |
650 | 6 | |a Microlithographie |0 (CaQQLa)201-0141616 |x Matériaux |0 (CaQQLa)201-0379329 |v Congrès. |0 (CaQQLa)201-0378219 | |
650 | 7 | |a polymers. |2 aat |0 (CStmoGRI)aat300218300 | |
650 | 7 | |a Microlithography |x Materials. |2 fast |0 (OCoLC)fst01019885 | |
650 | 7 | |a Photoresists. |2 fast |0 (OCoLC)fst01062099 | |
650 | 7 | |a Polymers. |2 fast |0 (OCoLC)fst01070588 | |
650 | 7 | |a Polymères |x Congrès. |2 ram | |
650 | 7 | |a Polymérisation |x Congrès. |2 ram | |
650 | 7 | |a Lithographie |x Congrès. |2 ram | |
650 | 7 | |a Électronique |x Congrès. |2 ram | |
650 | 7 | |a Optique non linéaire |x Congrès. |2 ram | |
650 | 7 | |a Photons |x Congrès. |2 ram | |
653 | 0 | |a Microlithography |a Materials |a Congresses | |
653 | 0 | |a Photoresists |a Congresses | |
653 | 0 | |a Polymers | |
655 | 7 | |a Conference papers and proceedings. |2 fast |0 (OCoLC)fst01423772 | |
700 | 1 | |a Bowden, M. J., |d 1943- | |
700 | 1 | |a Turner, S. Richard, |d 1942- | |
710 | 2 | |a American Chemical Society. |b Division of Polymeric Materials: Science and Engineering. | |
710 | 2 | |a American Chemical Society. |b Meeting |n (192nd : |d 1986 : |c Anaheim, Calif.) | |
830 | 0 | |a Advances in chemistry series ; |v 218. | |
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